Functional plasma polymers deposited in capacitively and inductively coupled plasmas

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Nonlocal power deposition in inductively coupled plasmas.

Radiofrequency (rf) plasmas exhibit field penetration well beyond the classical skin depth. Two physical explanations are proposed. First, by tracing orbits of electrons through many rf cycles in a cylindrical system, it is shown that numerous ionizing electrons can reach the interior. Second, current-carrying electrons can form a long-lived torus that drifts toward the axis, causing frequently...

متن کامل

Nonlinear effects in inductively coupled plasmas

Nonlinear effects in an inductive discharge have been studied experimentally and theoretically in a low pressure and low frequency operational regime. Plasma dynamics at these conditions is strongly nonlinear due to inertial and Lorentz forces. Nonlinear plasma polarization at the second harmonic and mean ~ponderomotive! potential as well as generation of the electric current at the second harm...

متن کامل

Inductively coupled plasmas at low driving frequencies

We discuss the peculiarities of inductively coupled plasma (ICP) at low driving frequencies. The ratio of electric to magnetic field, E cB , ∣ ( )∣ decreases with decreasing frequency according to Faraday’s law—higher magnetic fields are required to induce the same electric field at lower frequencies. We point out that the ratio of E cB ∣ ( )∣ can be non-uniform in space depending on primary co...

متن کامل

Non-equilibriummodeling of Inductively Coupled Rf Plasmas

This paper discusses the modeling of non-equilibrium effects in inductively coupled plasma facilities. The model relies on the solution of the Navier-Stokes and Maxwell equations in a one-dimensional geometry. Steady-state solutions are obtained by means of an implicit Finite Volume method. Non-equilibrium effects are treated by means of a hybrid State-to-State formulation. The electronic state...

متن کامل

Penetration of plasma into the wafer-focus ring gap in capacitively coupled plasmas

In plasma etching equipment for microelectronics fabrication, there is an engineered gap between the edge of the wafer and wafer terminating structures, such as focus rings. The intended purpose of these structures is to make the reactant fluxes uniform to the edge of the wafer and so prevent a larger than desired edge exclusion where useful products cannot be obtained. The wafer-focus ring gap...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Applied Physics Letters

سال: 2012

ISSN: 0003-6951,1077-3118

DOI: 10.1063/1.3681382